Items Tagged With Imaging

EM Optomechanical, Inc. of Albuquerque, NM, USA, recently obtained a license from Sandia National Laboratories to produce products based on a Labs-developed technology—a new configuration for interference microscopy.

by David Grandy
Anasys Instruments Corp., 3944 State Street, Suite 345, Santa Barbara, CA 93105, USA. www.anasysinstruments.com

FEI Company and Malvern Instruments Ltd (Malvern, UK) have entered into a joint development and marketing programme for advanced nanoparticle analysis utilising Malvern’s particle image analysis software on FEI’s line of Quanta™ scanning electron microscopes (SEMs). The combination delivers a powerful particle analysis solution that extends current analysis technologies for nano-sized particles.

The FEI Company will expand its top-of-the-line Helios NanoLab(TM) family of DualBeams when it introduces the Helios NanoLab 400 and 400S systems next week at SEMICON Japan. Combining advanced focused ion beam (FIB) and scanning electron microscope (SEM) technologies in a highly-integrated and easy-to-use platform, the Helios NanoLab family of tools will provide semiconductor manufacturers with a complete range of advanced high-resolution solutions for their analytical labs.